Open AccessAlignment System for X-Ray Lithography.
Author(s) -
Hao Zhou
Publication year - 2022
Language(s) - Danish
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_disstheses.5918
Subject(s) - optics , lithography , grating , resist , photodiode , materials science , wafer , diffraction grating , diffraction , laser , full width at half maximum , optoelectronics , x ray lithography , focus (optics) , physics , nanotechnology , layer (electronics)