Open AccessAlignment System for X-Ray Lithography.
Author(s) -
Hao Zhou
Publication year - 1994
Language(s) - Danish
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_disstheses.5918
Subject(s) - optics , lithography , grating , resist , photodiode , materials science , diffraction grating , wafer , diffraction , laser , optoelectronics , full width at half maximum , physics , nanotechnology , layer (electronics)
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