Open AccessReactor Analysis of Chemical Vapor Deposition of Titanium Dioxide and Copper Thin Films.
Author(s) -
Wing-cheong Lai
Publication year - 1994
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_disstheses.5811
Subject(s) - copper , chemical vapor deposition , materials science , deposition (geology) , hydrogen , analytical chemistry (journal) , substrate (aquarium) , thin film , torr , titanium , thermodynamics , chemistry , metallurgy , nanotechnology , physics , paleontology , oceanography , organic chemistry , chromatography , sediment , geology , biology
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