Open AccessLow-Temperature Oxidation of Silicon Using Point-To-Plane Corona Discharge.
Author(s) -
Mohammad Madani
Publication year - 1990
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_disstheses.5074
Subject(s) - analytical chemistry (journal) , thermal oxidation , oxide , materials science , silicon , atmospheric temperature range , leakage (economics) , optoelectronics , chemistry , metallurgy , macroeconomics , physics , chromatography , meteorology , economics
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