Open AccessDeveloping defect-tolerant demolding process in nanoimprint lithography
Author(s) -
Alborz Amirsadeghi
Publication year - 2022
Language(s) - Uncategorized
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_dissertations.3376
Subject(s) - resist , materials science , nanoimprint lithography , composite material , curing (chemistry) , shrinkage , photoresist , fabrication , layer (electronics) , medicine , alternative medicine , pathology