Developing defect-tolerant demolding process in nanoimprint lithography | Zendy

AI Assistant Blog Pricing

Open Access

Developing defect-tolerant demolding process in nanoimprint lithography

Author(s) -

Alborz Amirsadeghi

Publication year - 2013

Language(s) - Uncategorized

Resource type - Dissertations/theses

DOI - 10.31390/gradschool_dissertations.3376

Subject(s) - resist , materials science , composite material , curing (chemistry) , nanoimprint lithography , shrinkage , photoresist , layer (electronics) , fabrication , medicine , alternative medicine , pathology

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom

About

About Careers Publisher Partners Contact Us Our institutional solutions Get Organisational Trial or Quote

Learn

FAQs Blog Terms of Use Privacy Policy

Download the Zendy App

Download on the

Discover

Explore

Copyright Knowledge E © 2026. All Rights Reserved.