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Monolithic integration of high-aspect-ratio microstructures with CMOS circuitry
Author(s) -
Tinghui Xin
Publication year - 2022
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_dissertations.2573
Subject(s) - materials science , electroplating , photoresist , microsystem , microprobe , cmos , optoelectronics , resist , stress (linguistics) , composite material , nanotechnology , layer (electronics) , mineralogy , linguistics , chemistry , philosophy

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