Open AccessPrecursors for copper chemical vapor deposition
Author(s) -
Muna Bufaroosha
Publication year - 2022
Language(s) - Uncategorized
Resource type - Dissertations/theses
DOI - 10.31390/gradschool_dissertations.1437
Subject(s) - allylamine , chemistry , dimethylamine , adduct , amine gas treating , copper , methylamine , inorganic chemistry , polymer chemistry , nitrogen , organic chemistry , polymer , polyelectrolyte