Open AccessGrowth and characterization of microcrystalline silicon films and devices using very high frequency plasma enhanced chemical vapor deposition
Author(s) -
Joshua Ali Graves
Publication year - 2020
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.31274/rtd-20200803-197
Subject(s) - chemical vapor deposition , plasma enhanced chemical vapor deposition , microcrystalline silicon , characterization (materials science) , materials science , microcrystalline , plasma , silicon , optoelectronics , combustion chemical vapor deposition , plasma processing , deposition (geology) , chemical engineering , nanotechnology , thin film , analytical chemistry (journal) , carbon film , chemistry , environmental chemistry , engineering , crystallography , crystalline silicon , physics , amorphous silicon , biology , paleontology , quantum mechanics , sediment