Open AccessNITROGEN INFLUENCE ON THE CORROSION RESISTANCE OF THIN Ti-O-N FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING
Author(s) -
Boytsova Elena,
Voroshilov Fedor,
Leonova Liliya
Publication year - 2021
Publication title -
materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.293
H-Index - 22
ISSN - 0137-1339
DOI - 10.31044/1684-579x-2021-0-1-3-6
Subject(s) - materials science , passivation , corrosion , metallurgy , polarization (electrochemistry) , sputter deposition , coating , thin film , gravimetric analysis , titanium , oxide , electrochemistry , dissolution , nitrogen , sputtering , chemical engineering , composite material , electrode , layer (electronics) , nanotechnology , chemistry , organic chemistry , engineering
The electrochemical and gravimetric methods were used to study the effect of nitrogen using in the reaction mixture during magnetron deposition on the Ti-O-N films corrosion-electrochemical behavior. Polarization studies of the films electrochemical dissolution in aque-ous solution of 3 % NaCl in a potentiostatic mode are presented. It was found that upon dis-solution of the films, passivation, activation, and passivation of the coating surface are ob-served, associated with the formation of oxide films and titanium chlorides on the sample sur-face. It has been proved that thin films obtained with a high nitrogen content exhibit higher corrosion resistance. In this work, the following corrosion parameters were calculated: mass, depth and current indicators.