Open AccessPembangkitan Plasma Menggunakan Metode High-Voltage Direct Current Untuk Aplikasi Direct Current Magnetron Sputtering
Author(s) -
Syarifah Nihlah Yahya,
Fadli Robiandi,
Ikal Maknun
Publication year - 2021
Publication title -
progressive physics journal
Language(s) - Uncategorized
Resource type - Journals
ISSN - 2722-7707
DOI - 10.30872/ppj.v2i2.778
Subject(s) - plasma , diode , transformer , optoelectronics , materials science , capacitor , cavity magnetron , sputter deposition , direct current , high voltage , sputtering , voltage , electrical engineering , electrode , chemistry , thin film , physics , engineering , nanotechnology , nuclear physics
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