Open AccessSpectroscopic study for plasma parameters in co-sputtering system
Author(s) -
Kadhim A. Aadim
Publication year - 2019
Publication title -
iraqi journal of physics
Language(s) - English
Resource type - Journals
eISSN - 2664-5548
pISSN - 2070-4003
DOI - 10.30723/ijp.v14i31.179
Subject(s) - materials science , argon , electron temperature , analytical chemistry (journal) , electron density , plasma , torr , sputtering , atomic physics , ion , electron , thin film , chemistry , physics , nanotechnology , organic chemistry , chromatography , quantum mechanics , thermodynamics
In this work the parameters of plasma (electron temperature Te,electron density ne, electron velocity and ion velocity) have beenstudied by using the spectrometer that collect the spectrum ofplasma. Two cathodes were used (Si:Si) P-type and deposited onglass. In this research argon gas has been used at various values ofpressures (0.5, 0.4, 0.3, and 0.2 torr) with constant deposition time4 hrs. The results of electron temperature were (31596.19, 31099.77,26020.14 and 25372.64) kelvin, and electron density (7.60*1016,8.16*1016, 6.82*1016 and 7.11*1016) m-3. Optical properties of Siwere determined through the optical transmission method usingultraviolet visible spectrophotometer with in the range(300 – 1100) nm.