Open AccessAluminum Concentration Drives the Structural Evolution of Magnetron Sputtering (Ti, Al) C Thin Film
Author(s) -
Ahmed Al-Ghaban
Publication year - 2018
Publication title -
engineering and technology journal
Language(s) - English
Resource type - Journals
eISSN - 2412-0758
pISSN - 1681-6900
DOI - 10.30684/etj.36.1a.11
Subject(s) - aluminium , materials science , sputter deposition , high power impulse magnetron sputtering , sputtering , thin film , cavity magnetron , metallurgy , optoelectronics , engineering physics , nanotechnology , engineering
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