Open AccessSystematic Optimisation of Process Parameters in Laser Drilling of 200 µm Photovoltaic Silicon Wafers Using New Kind of Nanosecond IR Lasers
Author(s) -
K.-P. Stolberg
Publication year - 2009
Publication title -
journal of laser micro nanoengineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 26
ISSN - 1880-0688
DOI - 10.2961/jlmn.2009.03.0017
Subject(s) - wafer , materials science , nanosecond , laser , photovoltaic system , optoelectronics , silicon , laser drilling , process (computing) , optics , drilling , metallurgy , computer science , electrical engineering , engineering , physics , operating system