Open AccessSOFTWARE COMPLEX FOR PHOTOLITHOGRAPHY OPTIMIZATION FOR MINIMIZATION OF SIDEWALL ROUGHNESS EFFECTS IN NANOSTRUCTURES. GROUNDS AND PROBLEM STATEMENT
Author(s) -
Andrey Sharapov,
E. S. Shamin,
Ilya Skuratov,
Е. С. Горнев
Publication year - 2020
Publication title -
international forum “microelectronics – 2020”. joung scientists scholarship “microelectronics – 2020”. xiii international conference «silicon – 2020». xii young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis
Language(s) - English
Resource type - Conference proceedings
DOI - 10.29003/m1654.silicon-2020/375-377
Subject(s) - photolithography , nanoelectronics , surface finish , surface roughness , software , materials science , minification , computer science , nanostructure , lithography , nanotechnology , engineering drawing , mechanical engineering , electronic engineering , engineering , optoelectronics , composite material , programming language