Open AccessMETHOD FOR CALCULATION OF MASK SPECIFICATION CONTRIBUTION TO LITHOGRAPHIC BUDGETS
Author(s) -
Nikita N. Balan,
V. V. Ivanov,
А. С. Панкратов,
Ekaterina Kharchenko
Publication year - 2020
Publication title -
international forum “microelectronics – 2020”. joung scientists scholarship “microelectronics – 2020”. xiii international conference «silicon – 2020». xii young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis
Language(s) - English
Resource type - Conference proceedings
DOI - 10.29003/m1653.silicon-2020/372-374
Subject(s) - photomask , lithography , computer science , computational lithography , optical proximity correction , quality (philosophy) , electronic engineering , x ray lithography , engineering , materials science , resist , nanotechnology , optoelectronics , physics , layer (electronics) , quantum mechanics