Open AccessFORMATION POSSIBILITY OF THE AL3SI METASTABLE PHASE DURING ION-BEAM AND MAGNETRON DEPOSITION OF COMPOSITE AL-SI FILMS
Author(s) -
É. P. Domashevskaya,
В. А. Терехов,
I. E. Zanin,
Konstantin A. Barkov
Publication year - 2020
Publication title -
international forum “microelectronics – 2020”. joung scientists scholarship “microelectronics – 2020”. xiii international conference «silicon – 2020». xii young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis
Language(s) - English
Resource type - Conference proceedings
DOI - 10.29003/m1584.silicon-2020/149-152
Subject(s) - materials science , sputter deposition , ion beam , metastability , cavity magnetron , ion , diffraction , ion beam assisted deposition , composite number , analytical chemistry (journal) , deposition (geology) , phase (matter) , spectroscopy , sputtering , thin film , optics , chemistry , composite material , nanotechnology , physics , paleontology , organic chemistry , chromatography , quantum mechanics , sediment , biology