Open AccessINVESTIGATION OF THE KINETICS OF INTERACTION OF CHEMICALLY ACTIVE PARTICLES WITH THE SILICON SURFACE DURING DEEP CRYOGENIC ETCHING
Author(s) -
Yaroslav Miroshkin,
Askar Rezvanov
Publication year - 2020
Publication title -
international forum “microelectronics – 2020”. joung scientists scholarship “microelectronics – 2020”. xiii international conference «silicon – 2020». xii young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis
Language(s) - English
Resource type - Conference proceedings
DOI - 10.29003/m1582.silicon-2020/142-145
Subject(s) - kinetics , silicon , etching (microfabrication) , adsorption , desorption , materials science , chemical engineering , anisotropy , work (physics) , isotropic etching , nanotechnology , chemistry , optoelectronics , layer (electronics) , thermodynamics , optics , physics , quantum mechanics , engineering