Open AccessESTIMATION OF THE DOSE OF SILICON AMORPHIZATION IN A WIDE RANGE OF ION IMPLANTATION PARAMETERS WITH LIGHT IONS
Author(s) -
Evgeniya Okulich,
V. I. Okulich,
D. I. Tetelbaum
Publication year - 2020
Publication title -
international forum “microelectronics – 2020”. joung scientists scholarship “microelectronics – 2020”. xiii international conference «silicon – 2020». xii young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysis
Language(s) - English
Resource type - Conference proceedings
DOI - 10.29003/m1579.silicon-2020/133-136
Subject(s) - silicon , ion , materials science , ion implantation , range (aeronautics) , dielectric , optoelectronics , atomic physics , chemistry , physics , composite material , organic chemistry