Open AccessDetonation spray method: features of technical implementation of the process and technology for obtaining ultrathin layers of semiconductor oxides
Author(s) -
Павло Петрович Москвін,
В. А. Рудницкий
Publication year - 2019
Publication title -
vìsnik žitomirsʹkogo deržavnogo tehnologìčnogo unìversitetu. tehnìčnì nauki/vìsnik žitomirsʹkogo deržavnogo tehnologìčnogo unìversitetu. serìâ: tehnìčnì nauki
Language(s) - English
Resource type - Journals
eISSN - 2522-1779
pISSN - 1728-4260
DOI - 10.26642/tn-2019-1(83)-228-235
Subject(s) - detonation , semiconductor , materials science , process (computing) , substrate (aquarium) , enhanced data rates for gsm evolution , semiconductor device fabrication , process engineering , mechanical engineering , nanotechnology , optoelectronics , computer science , explosive material , chemistry , engineering , telecommunications , oceanography , organic chemistry , wafer , geology , operating system