Open AccessInfluence of the plasma effect on the diffusion saturation of contacting surfaces in the chip formation zone
Author(s) -
Виктор Александрович Сошко,
Михаил Игоревич Подольский,
Дмитрий Дмитриевич Федорчук
Publication year - 2017
Publication title -
vìsnik žitomirsʹkogo deržavnogo tehnologìčnogo unìversitetu. tehnìčnì nauki/vìsnik žitomirsʹkogo deržavnogo tehnologìčnogo unìversitetu. serìâ: tehnìčnì nauki
Language(s) - English
Resource type - Journals
eISSN - 2522-1779
pISSN - 1728-4260
DOI - 10.26642/tn-2017-2(80)-84-89
Subject(s) - thermal , hydrogen , diffusion , materials science , plasma , metal , electromigration , thermal diffusivity , ionization , chemical physics , mechanics , thermodynamics , composite material , chemistry , metallurgy , ion , physics , organic chemistry , quantum mechanics