Open AccessEffect of copper nanoparticles on plasma glow intensity of high frequency capacitive discharge
Author(s) -
M. K. Dosbolayev,
M. Slamia
Publication year - 2020
Publication title -
vestnik. seriâ fizičeskaâ/habaršysy - a̋l-farabi atyndaġy k̦azak̦ memlekettik u̇lttyk̦ universitetì. fizika seriâsy
Language(s) - English
Resource type - Journals
eISSN - 2663-2276
pISSN - 1563-0315
DOI - 10.26577/rcph.2020.v75.i4.03
Subject(s) - plasma , materials science , glow discharge , sputter deposition , nanoparticle , sputtering , cavity magnetron , argon , plasma parameters , copper , nanoclusters , analytical chemistry (journal) , atomic physics , nanotechnology , thin film , chemistry , metallurgy , chromatography , physics , quantum mechanics