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Synthesis of carbon nanowalls by the method of plasma enhanced chemical vapor deposition in a radio-frequency discharge plasma
Author(s) -
Ye. Yerlanuly,
D.G. Batryshev,
Masaru Hori
Publication year - 2019
Publication title -
vestnik. seriâ fizičeskaâ/habaršysy - a̋l-farabi atyndaġy k̦azak̦ memlekettik u̇lttyk̦ universitetì. fizika seriâsy
Language(s) - English
Resource type - Journals
eISSN - 2663-2276
pISSN - 1563-0315
DOI - 10.26577/rcph-2019-1-1099
Subject(s) - chemical vapor deposition , scanning electron microscope , nanoclusters , materials science , dangling bond , raman spectroscopy , graphene , analytical chemistry (journal) , etching (microfabrication) , plasma etching , plasma , chemical engineering , chemistry , nanotechnology , optoelectronics , layer (electronics) , organic chemistry , silicon , optics , quantum mechanics , physics , engineering , composite material

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