Open AccessThe effect of thermal and microwave treatments on the properties of amorphous DLC-films formed by deposition in CH4 plasma
Author(s) -
А.Р. ПРОКОПЬЕВ,
Е.П. НЕУСТРОЕВ
Publication year - 2022
Publication title -
vestnik severo-vostočnogo federalʹnogo universiteta imeni m.k. ammosova
Language(s) - English
Resource type - Journals
eISSN - 2587-5620
pISSN - 2222-5404
DOI - 10.25587/svfu.2022.50.47.004
Subject(s) - plasma enhanced chemical vapor deposition , deposition (geology) , materials science , amorphous solid , plasma , chemical engineering , microwave , thermal , analytical chemistry (journal) , chemistry , thin film , nanotechnology , crystallography , computer science , environmental chemistry , geology , engineering , telecommunications , physics , paleontology , quantum mechanics , sediment , meteorology