Open AccessUltrahigh Vacuum Preparation and Passivation of Abrupt SiO2/Si(111) Interfaces
Author(s) -
Bert Stegemann,
Daniel Sixtensson,
Thomas Lußky,
Ulrike Bloeck,
M. Schmidt
Publication year - 2007
Publication title -
chimia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.387
H-Index - 55
eISSN - 2673-2424
pISSN - 0009-4293
DOI - 10.2533/chimia.2007.826
Subject(s) - dangling bond , passivation , materials science , suboxide , oxide , crystallinity , stoichiometry , silicon , annealing (glass) , oxygen , chemical physics , chemical engineering , nanotechnology , optoelectronics , layer (electronics) , chemistry , composite material , metallurgy , organic chemistry , engineering