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Numerical methods for the analysis of laser annealing of doped semiconductor wafers
Author(s) -
J. KIRKPATRICK,
G. GILES,
Richard M. Wood
Publication year - 1980
Publication title -
30th thermophysics conference
Language(s) - English
Resource type - Conference proceedings
DOI - 10.2514/6.1980-1473
Subject(s) - dopant , materials science , annealing (glass) , wafer , doping , semiconductor , ion implantation , optoelectronics , laser , ion , optics , metallurgy , chemistry , physics , organic chemistry

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