Open AccessElectrical Properties and Optimum Conditions of A Home-Made Magnetron Plasma Sputtering System
Author(s) -
Sarah A. Hassan,
Ahmed Abed Anber,
Eidan Asi Abdullah,
Jafer Fahdel Odah,
Najwa J. Jubier,
Ali Adnan Abd Alwahab
Publication year - 2021
Publication title -
iraqi journal of science
Language(s) - English
Resource type - Journals
eISSN - 2312-1637
pISSN - 0067-2904
DOI - 10.24996/ijs.2021.62.11(si).16
Subject(s) - materials science , sputtering , argon , plasma , electrode , sputter deposition , voltage , electrical resistivity and conductivity , current (fluid) , optoelectronics , discharge pressure , analytical chemistry (journal) , cavity magnetron , electric discharge in gases , thin film , electrical engineering , atomic physics , chemistry , thermodynamics , nanotechnology , physics , gas compressor , engineering , quantum mechanics , chromatography
In this work, the electrical properties and optimum conditions of the plasma sputtering system have been studied. The electrical properties such as Paschen's curve, current-voltage, current pressure relations, the strength of magnetic field as a function of inter-electrode distance, the influence of gas working pressure and argon-oxygen ratio on the electrical characterization were studied to determine the basic optimum condition of the system operation. the discharge current as a function of discharge voltage showed high discharge current at 2.5 cm. These parameters represent the basic conditions to operate any plasma sputtering system which are the right behavior to build up and design the discharge an electrode. The ideal conditions of these homemade systems were qualified to prepare the various nanostructure thin films. The two electrodes were made of copper because of its good conductivity, and to avoid the power dissipation inside discharge chamber.