Open AccessDiffusion of Phosphorus in Silicon Thin Films by Spin and Dip Coating
Author(s) -
Armel Duvalier Péné,
Bouchaíb Hartiti,
Laurent Bitjoka,
George Elambo Nkeng,
C. Kapseu,
Philippe Thévenin
Publication year - 2020
Publication title -
international journal of science and technoledge
Language(s) - English
Resource type - Journals
ISSN - 2321-919X
DOI - 10.24940/theijst/2021/v9/i6/st2106-013
Subject(s) - spin coating , materials science , phosphoric acid , diffusion , coating , silicon , wafer , doping , sol gel , dip coating , chemical engineering , analytical chemistry (journal) , nanotechnology , optoelectronics , chemistry , chromatography , metallurgy , physics , engineering , thermodynamics