Open AccessStructural and Electrical Specification of ZrO2Nano Thin Film Prepared by PLD
Author(s) -
Suroor Hikmat,
Thamir A. Jumah
Publication year - 2021
Publication title -
al-nahrain journal of science
Language(s) - English
Resource type - Journals
eISSN - 2663-5461
pISSN - 2663-5453
DOI - 10.22401/anjs.24.2.05
Subject(s) - materials science , thin film , annealing (glass) , amorphous solid , pulsed laser deposition , crystallite , hall effect , tetragonal crystal system , monoclinic crystal system , carbon film , electrical resistivity and conductivity , analytical chemistry (journal) , composite material , crystallography , nanotechnology , crystal structure , metallurgy , chemistry , electrical engineering , engineering , chromatography
Zirconium dioxide was prepared as a thin film by using pulse laser deposition (PLD).Subsequently, the films had been thermally treated by annealing process at temperature 450 oC. The structural and electrical parameters of thin films were investigated. As-deposited films were amorphous and had a large surface density of ablated particles. The Annealing process resulted change the phase from amorphous to polycrystalline. The X-ray diffraction of all these films has a polycrystalline structure with two different phases named tetragonal and monoclinic. Hall measurements indicate that the charge carriers of all these films were p-type. In addition, the Hall coefficient suffers some change with thin film thickness. The AC results measured showed the films have resistance and capacitance properties. The AC conduction is dominated by hole cattier.