Open AccessImpact of silicon wafer surface treatment on the morphology of GaP layers produced by plasma enhanced atomic layer deposition
Author(s) -
A V Uvarov,
V. A. Sharov,
D. A. Kudryashov,
А.С. Гудовских
Publication year - 2022
Publication title -
физика и техника полупроводников
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.287
H-Index - 40
eISSN - 1726-7315
pISSN - 0015-3222
DOI - 10.21883/sc.2022.02.53701.9748
Subject(s) - materials science , silicon , wafer , surface roughness , layer (electronics) , deposition (geology) , plasma , etching (microfabrication) , substrate (aquarium) , surface finish , epitaxy , analytical chemistry (journal) , nanotechnology , composite material , optoelectronics , chemistry , paleontology , oceanography , physics , quantum mechanics , chromatography , sediment , geology , biology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom