Open AccessMethods for investigation of electrical contact resistance in a metal film--semiconductor structure
Author(s) -
Shtern M.Yu.,
I. S. Karavaev,
М. С. Рогачев,
Shtern Yu. I.,
Bekhzod R. Mustafoev,
E. P. Korchagin,
A. O. Kozlov
Publication year - 2022
Publication title -
физика и техника полупроводников
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.287
H-Index - 40
eISSN - 1726-7315
pISSN - 0015-3222
DOI - 10.21883/sc.2022.01.53115.24
Subject(s) - contact resistance , materials science , electrical contacts , thermoelectric effect , semiconductor , ohm , electrical resistivity and conductivity , electrical resistance and conductance , quantum tunnelling , thermoelectric materials , composite material , optoelectronics , electrical engineering , thermal conductivity , engineering , physics , layer (electronics) , thermodynamics
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