Open AccessФормирование наноразмерных пленок золота в условиях многократного автооблучения при ионно-лучевом осаждении
Author(s) -
С.А. Шарко,
А.И. Серокурова,
Н.Н. Новицкий,
А.И. Стогний,
В.А. Кецко
Publication year - 2022
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2022.01.51875.18930
Subject(s) - sputtering , materials science , nanometre , silicon , deposition (geology) , substrate (aquarium) , nanoscopic scale , metal , quartz , thin film , nanotechnology , optoelectronics , composite material , metallurgy , paleontology , oceanography , sediment , geology , biology
Gold films with a thickness of several tens of nanometers were obtained on silicon and quartz substrates by ion-beam deposition – sputtering. It is shown that the predominant lateral growth of nanoscale metal layers along the substrate surface occurs under exposure to the high-energy component of the sputtered atoms flux. The decisive role in the nanometer gold film for-mation is played by the elastic collision of sputtered metal atoms with atoms of the substrate and the growing film. The application of the manifold deposition – sputtering operation allows sup-pressing the grain formation process and obtaining gold films with better characteristics than those with a single deposition.