Open AccessФормирование текстуры (100) в тонких пленках Ti под действием низкоэнергетической ионной бомбардировки
Author(s) -
Р.В. Селюков,
М.О. Изюмов,
В. В. Наумов,
Л.А. Мазалецкий
Publication year - 2021
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2021.23.51782.18890
Subject(s) - texture (cosmology) , materials science , ion , analytical chemistry (journal) , chemistry , chromatography , computer science , organic chemistry , artificial intelligence , image (mathematics)
10-40 nm Ti films with mixed crystalline texture (100)+(001) are exposed to ion bombardment in inductively coupled Ar plasma by applying the bias -30 V to the films. It is found that such a treatment leads to the formation of (100) texture in films. This result is explained by the generation of the compressive stress in films as a result of ion bombardment. The thinner the film the less time is required to form the (100) texture.