Open AccessНаноструктурирование при наклонном напылении алюминия
Author(s) -
О.С. Трушин,
А.А. Попов,
А.Н. Пестова,
Л.А. Мазалецкий,
А.А. Акулов
Publication year - 2021
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2021.12.51064.18748
Subject(s) - nanorod , materials science , substrate (aquarium) , silicon , evaporation , aspect ratio (aeronautics) , thin film , optics , electron beam physical vapor deposition , deposition (geology) , transverse plane , nanotechnology , optoelectronics , physics , paleontology , oceanography , structural engineering , sediment , biology , engineering , thermodynamics , geology
Formation of regular arrays of nanorods with high aspect ratio (length to transverse size) has been found in the process of Al thin film growth at oblique angle deposition on silicon substrate by the method of electron beam evaporation. It was found that the optimal conditions for nanostructuring are realized at the inclination angle larger than 80 degrees.