Open AccessПолучение TiN-покрытий реактивным анодным испарением титана в разряде с самонакаливаемым полым катодом
Author(s) -
A. I. Men’shakov,
D. R. Emlin
Publication year - 2021
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2021.10.50971.18646
Subject(s) - tin , titanium , materials science , evaporation , cathode , deposition (geology) , nitrogen , plasma , analytical chemistry (journal) , titanium nitride , substrate (aquarium) , ion , anode , metallurgy , electrode , chemistry , composite material , layer (electronics) , nitride , environmental chemistry , paleontology , physics , oceanography , organic chemistry , quantum mechanics , sediment , biology , thermodynamics , geology
A method for TiN-coatings deposition by anodic evaporation of titanium in a high-current gas discharge (30 A) with a self–heated hollow cathode in an Ar+N2 medium is proposed. Optical spectral analysis shows that a large amount of activated titanium is present in the gas-discharge plasma, and the proportion of metal ions coming from the plasma to the substrate, taking into account the single-charge ions, reaches 70%. At a nitrogen flow of 5 sccm, TiN-coatings with a thickness of 2 µm and a hardness of up to 24 GPa were obtained. The deposition rate at a distance of 7 cm from the vapor source was ~4 µm/h.