
Радиоактивационный контроль плотности износостойких покрытий AlN и CrN на кремнии
Author(s) -
В.А. Рыжков,
В.А. Тарбоков,
Е.А. Смолянский,
Г.Е. Ремнев
Publication year - 2021
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2021.10.50969.18722
Subject(s) - materials science , sputter deposition , nitride , coating , cavity magnetron , deposition (geology) , carbide , sputtering , analytical chemistry (journal) , metallurgy , composite material , thin film , nanotechnology , layer (electronics) , chemistry , paleontology , chromatography , sediment , biology
In this work, the mass and linear thicknesses of AlN and CrN coatings deposited onto silicon substrates by magnetron sputtering were measured, respectively, by a combination of the methods of nondestructive radioactivation analysis on proton beams of the U-120M cyclotron and optical micro-interferometry. It is shown that, at linear thicknesses in the range of 2.2-5.7 μm, the coating density is close to the values for bulk materials AlN (3.26 g / cm3) and CrN (5.9 g / cm3), and the stoichiometry of nitrides is controlled by the parameters of magnetron deposition. The technique can also be used to determine the density of wear-resistant coatings from carbides and metal oxides.