Open AccessВлияние поэтапного постимплантационного отжига на состав и структуру поверхностных слоев кремния, имплантированного ионами щелочных металлов
Author(s) -
Б. Е. Умирзаков,
З. А. Исаханов,
Г.Х. Аллаёрова,
Р.М. Ёркулов
Publication year - 2021
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2021.01.50451.18494
Subject(s) - materials science , ion , monolayer , carbon fibers , oxygen , chemical composition , analytical chemistry (journal) , crystallography , chemistry , nanotechnology , composite material , organic chemistry , composite number , chromatography
Studies of the dynamics of changes in the crystal structure, elemental and chemical compositionof the surface layers of Si implanted with Na + , Rb + and Cs + ions during gradual heating invarious temperature conditions. In the case of Na + ions, after heating at a temperature of T = 900K, a NaSi 2 film is formed on the surface, at T = 1000 K, a monolayer coating of NaSi 2 and at T =1100 K the surface layers of Si are completely cleaned of atoms of the alloying element, as wellas oxygen and carbon.