Open AccessИсследование приповерхностного слоя германия, имплантированного ионами кобальта
Author(s) -
В.В. Базаров,
В.А. Шустов,
Н.М. Лядов,
И.А. Файзрахманов,
И.В. Янилкин,
С.М. Хантимеров,
Р.Р. Гарипов,
Р.Р. Фатыхов,
Н.М. Сулейманов,
В.Ф. Валеев
Publication year - 2019
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2019.20.48392.17949
Subject(s) - germanium , germanide , materials science , scanning electron microscope , cobalt , irradiation , layer (electronics) , surface layer , ion , ion implantation , analytical chemistry (journal) , chemistry , nanotechnology , optoelectronics , metallurgy , silicon , composite material , physics , organic chemistry , chromatography , nuclear physics
The results of investigation of germanium surface nanostructured by ion implantation are presented. Single-crystal plates of germanium (c Ge) were irradiated by cobalt ions with an energy of 40 keV in the dose range (2 × 1016 - 8 × 1016) Co + / cm2. The method of scanning electron microscopy (SEM) has been used to study the evolution of the morphology of germanium surface with an increase of implantation dose. It has been found that with increasing dose of implantation, a layer of spherical formations with diameter of ~ 150 nm gradually forms on the surface of implanted germanium. The analysis of X-ray diffraction spectra indicated the appearance of nano-sized cobalt germanide (CoGe) particles in the implanted layer.