Open AccessИсследование формирования антиотражающего покрытия каскадных солнечных элементов
Author(s) -
А.В. Малевская,
Ю.М. Задиранов,
А.А. Блохин,
В.М. Андреев
Publication year - 2019
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2019.20.48386.17916
Subject(s) - heterojunction , materials science , coating , etching (microfabrication) , optoelectronics , anti reflective coating , isotropic etching , reflection (computer programming) , adhesion , evaporation , optics , nanotechnology , composite material , layer (electronics) , physics , computer science , thermodynamics , programming language
Investigations of antireflection coating creating for multijunction solar cells based on AIIIBV heterostructures have been carried out. Investigated were modes of treatment of a heterostructure surface with application of plasma-chemical, liquid chemical and ion-beam etching methods. Technology for creating antireflection coating based on ТiOx/SiO2 layers was developed. Improvement of parameters of coating adhesion to the heterostructure surface and reduction of the reflection coefficient in multijunction solar cells were achieved.