Open AccessЭкспериментальное наблюдение эффекта ограничения каскада столкновений при распылении пористого кремния
Author(s) -
А.Е. Иешкин,
A. Tolstogouzov,
C.Е. Свяховский,
М.Н. Дроздов,
Vasiliy Pelenovich
Publication year - 2019
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2019.02.47222.17563
Subject(s) - sputtering , ion , silicon , yield (engineering) , materials science , cluster (spacecraft) , range (aeronautics) , atomic physics , particle (ecology) , nanoparticle , molecular physics , chemical physics , analytical chemistry (journal) , nanotechnology , chemistry , physics , thin film , optoelectronics , metallurgy , composite material , computer science , oceanography , organic chemistry , chromatography , geology , programming language
Results of investigation of the mass spectra of secondary ions sputtered from bulk (continuous) and porous silicon targets with various characteristic core particle dimensions are presented. It has been established that the sputtering of nanostructured Si samples leads to a significant increase in the relative yield of massive cluster ions. This effect is especially pronounced when the characteristic nanoparticle size approaches the range of bombarding ions in the Si target. The obtained results are explained taking into account the confinement of atomic collision cascades.