Open AccessСвойства пленок титаната бария-стронция на кремниевой подложке, нанесенных методом высокочастотного катодного распыления
Author(s) -
В. Б. Широков,
S. P. Zinchenko,
Л. И. Киселева,
А. В. Павленко
Publication year - 2018
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2018.24.47034.17105
Subject(s) - materials science , substrate (aquarium) , microstructure , crystallite , layer (electronics) , perpendicular , silicon , single crystal , sputtering , optics , crystal (programming language) , anisotropy , plane (geometry) , thin film , crystallography , optoelectronics , composite material , nanotechnology , chemistry , metallurgy , geometry , oceanography , mathematics , physics , computer science , programming language , geology
Using rf cathode sputtering of a target in the oxygen atmosphere, Ba_0.6Sr_0.4TiO_3 solid solution thin films have been formed on the single-crystal Si(001) cut surface and their crystal structure, microstructure, and optical characteristics have been investigated. It is shown that the films are optically anisotropic, polycrystalline, and have a c axis preferred direction perpendicular to the substrate. The a and b axes in the substrate plane have no preferred direction. It has been established that, during the synthesis, a buffer layer with a thickness of about 20 nm forms between the film and substrate, which is optically equivalent to silicon oxide.