Open AccessФормирование литографических рисунков ограненными микрочастицами оксида цинка на кремниевой подложке
Author(s) -
А.А. Бобков,
И.А. Пронин,
В.А. Мошников,
Н.Д. Якушова,
А.А. Карманов,
И.А. Аверин,
П.А. Сомов,
Е.И. Теруков
Publication year - 2018
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2018.15.46445.17281
Subject(s) - hydrothermal circulation , nanotechnology , materials science , silicon , computer science , engineering , optoelectronics , chemical engineering
Lithography techniques compatible with silicon technology have been developed within the hydrothermal method. Topological layouts were formed by faceted microcrystals with the developed surface. The prospects for implementing new hierarchical structures are of special interest.