Open AccessФормирование тонкого люминесцирующего слоя в кристаллах LiF под действием излучения тлеющего разряда
Author(s) -
А.А. Тютрин,
Д.С. Глазунов,
А.Л. Ракевич,
Е.Ф. Мартынович
Publication year - 2018
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2018.15.46435.17145
Subject(s) - luminescence , radiation , materials science , irradiation , ion , optics , analytical chemistry (journal) , atomic physics , chemistry , optoelectronics , physics , organic chemistry , chromatography , nuclear physics
The formation of thin layers of luminescent defects on the faces of planar lithium fluoride crystals located in the positive column and Faraday dark space of a glow gas discharge was studied by time-resolved confocal scanning luminescent microscopy and time-correlated single photon counting. The formation of aggregated color centers in the surface layers of crystals was established using the spectral and kinetic characteristics of luminescence appearing after irradiation. The role of gas discharge electrons, ions, and photons in the defect formation mechanism was considered. The defects were shown to be formed under the influence of vacuum ultraviolet (VUV) photons. The VUV radiation intensity distribution in the discharge gap was measured by the method of thermostimulated luminescence. The main source of this radiation was the anodic and cathodic voltage drop regions in a glow discharge.