Open AccessСинтез высокоориентированных пленок оксида цинка на аморфных подложках методом магнетронного распыления на постоянном токе
Author(s) -
А. М. Исмаилов,
Л.Л. Эмирасланова,
М. Х. Рабаданов,
М.Р. Рабаданов,
И Ш Алиев
Publication year - 2018
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2018.12.46291.16792
Subject(s) - materials science , sputter deposition , cavity magnetron , substrate (aquarium) , crystallite , amorphous solid , plasma , optoelectronics , oxide , chemical engineering , thin film , metallurgy , nanotechnology , sputtering , chemistry , crystallography , engineering , physics , geology , oceanography , quantum mechanics
AbstractWe describe the technology of obtaining highly oriented zinc-oxide (ZnO) films on amorphous substrates at high growth rates (up to 7 nm/s) by means of direct-current magnetron sputtering. It is suggested to optimize the substrate position with respect to magnetron and consider the floating potential to which the substrate is charged in magnetron discharge plasma as one of the main technological parameters. Electrondiffraction study of the structural characteristics of the obtained ZnO films showed that increase in the substrate temperature was accompanied by transformation of the crystallite shape from platelike to columnar.