Open AccessИсследование поверхностной проводимости двойного слоя таллия на Si(111) после адсорбции лития и рубидия
Author(s) -
M. V. Ryzhkova,
E. A. Borisenko,
M. V. Ivanchenko,
D. A. Tsukanov,
А. В. Зотов,
А. А. Саранин
Publication year - 2018
Publication title -
pisʹma v žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-7471
pISSN - 0320-0116
DOI - 10.21883/pjtf.2018.10.46094.17220
Subject(s) - rubidium , bilayer , adsorption , thallium , lithium (medication) , silicon , substrate (aquarium) , analytical chemistry (journal) , conductivity , electron diffraction , chemistry , crystallography , materials science , diffraction , physics , inorganic chemistry , optics , potassium , geology , medicine , biochemistry , oceanography , organic chemistry , chromatography , membrane , endocrinology
Changes in the state of a thallium bilayer on Si(111) substrate, Si(111)6 × 6–Tl, after adsorption of lithium and rubidium were studied using low-energy electron-diffraction and four-point probe-conductivity measurements. New surface reconstructions 5 × 1 and $$5\sqrt 3 \times 5\sqrt 3 $$ 5 3 × 5 3 were observed after the adsorption of lithium, and 2 × 2 and $$\sqrt 3 \times \sqrt 3 $$ 3 × 3 reconstructions appeared after the adsorption of rubidium. The surface conductivity of silicon substrates was studied as a function of the dose of deposited adsorbate. It is established that the formation of both 5 × 1 and 2 × 2 reconstructions retains the conducting properties of a two-dimensional channel constituted by the thallium bilayer.