Open AccessПлазмохимическое травление в постростовой технологии фотоэлектрических преобразователей
Author(s) -
А.В. Малевская,
Ю.М. Задиранов,
Н.Д. Ильинская,
Д.А. Малевский,
П.В. Покровский
Publication year - 2022
Publication title -
žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-748X
pISSN - 0044-4642
DOI - 10.21883/jtf.2022.04.52248.282-21
Subject(s) - fabrication , materials science , photovoltaic system , etching (microfabrication) , optoelectronics , isotropic etching , converters , heterojunction , degradation (telecommunications) , photovoltaic effect , leakage (economics) , voltage , layer (electronics) , nanotechnology , electronic engineering , electrical engineering , engineering , medicine , alternative medicine , pathology , economics , macroeconomics
Investigation of the heterostructure plasmachemical etching technology for fabricating multi-junction photovoltaic converters has been carried out. The dividing mesa-structure forming stage at different etching regimes and subsequent disturbed layer removing by liquid chemical treatment has been reviewed. The influence of mesa etching methods on cells photovoltaic characteristics has been investigated. Developed was the technology of photovoltaic converters fabrication with low current leakage values less than 10-9 A at voltage less then 1 V with high resistance to degradation.