Open AccessДифракционные решетки с блеском, получаемые на пластинах Si --- первые результаты
Author(s) -
Л.И. Горай,
Т.Н. Березовская,
Д.В. Мохов,
В.А. Шаров,
К.Ю. Шубина,
Е.В. Пирогов,
А.С. Дашков
Publication year - 2021
Publication title -
žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-748X
pISSN - 0044-4642
DOI - 10.21883/jtf.2021.10.51368.81-21
Subject(s) - materials science , optics , grating , etching (microfabrication) , groove (engineering) , wafer , diffraction , diffraction grating , scanning electron microscope , coating , surface finish , extreme ultraviolet lithography , optoelectronics , layer (electronics) , composite material , physics , metallurgy
Using direct laser lithography and liquid etching of polished vicinal Si(111) wafers, a technology was developed and diffraction gratings 500 /mm with a blaze angle of 4° were fabricated. The manufacturing process of a reflective Si-grating of a triangular profile (sawtooth) can be divided into four main steps: (1) obtaining a pattern of a protective mask for etching grooves; (2) anisotropic etching of grooves in KOH solution; (3) etching to smooth the grating profile and polish the surface of working facets; (4) coating to increase reflectivity. The samples obtained were characterized using scanning electron microscopy and atomic force microscopy methods to determine the shape of the groove profile and roughness: the shape turned out to be close to the ideal triangular, and the root-mean square roughness was less than 0.3 nm. With the help of the PCGrate™ code, taking into account the measured real groove profile, the diffraction efficiency of gratings operating in classical and conical mounts in soft-X-ray and extreme ultraviolet radiation has been simulated. The obtained efficiency values are close to the record ones for the corresponding spectral range and the Au-coating of the grating.