Open AccessТопография поверхности и пропускание света кварцевыми окнами после экспозиции в высокочастотном разряде в дейтерии и смеси дейтерия с азотом
Author(s) -
А.Е. Городецкий,
А.В. Маркин,
В.Л. Буховец,
В.И. Золотаревский,
Р.Х. Залавутдинов,
Н.А. Бабинов,
А.М. Дмитриев,
А.Г. Раздобарин,
Е.Е. Мухин
Publication year - 2021
Publication title -
žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-748X
pISSN - 0044-4642
DOI - 10.21883/jtf.2021.02.50366.180-20
Subject(s) - quartz , materials science , surface roughness , analytical chemistry (journal) , transmittance , plasma , sputtering , surface finish , diffusion , optics , thin film , optoelectronics , chemistry , composite material , nanotechnology , physics , chromatography , quantum mechanics , thermodynamics
The effect of a cleaning discharge plasma on the KU-1 optical quartz surface topography and transmission in visible and near IR ranges (400-1000 nm) was studied. For the study, we used crossed DC and RF discharges in D2 and D2/N2 mixture, where the N2 fraction was ~25 mol %. The addition of nitrogen increased sputtering rate from 250 to 1200 nm / h while maintaining stoichiometry of the surface layers. The rms surface roughness decreased after the plasma exposure from 1.3 to 0.6 nm, while the quartz transmittance has not changed. The surface roughness analysis and calculation of diffusion scattered light at 400 nm transmitted through the quartz were performed using the power spectral density function of AFM.