Open AccessВлияние толщины гидрогенизированных углеродных пленок, легированных кремнием и кислородом, на свойства их поверхности
Author(s) -
А. С. Гренадёров,
А. А. Соловьев,
К. В. Оскомов
Publication year - 2021
Publication title -
žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-748X
pISSN - 0044-4642
DOI - 10.21883/jtf.2021.01.50287.204-20
Subject(s) - materials science , wetting , substrate (aquarium) , composite material , silicon , contact angle , arc (geometry) , alloy , internal stress , plasma , cathode , metallurgy , chemistry , oceanography , geometry , mathematics , physics , quantum mechanics , geology
In this work, 0.5-7 µm thick a-C:H:SiOx films were obtained on silicon and VT6 ti-tanium alloy substrates in plasma of non-self-sustained arc discharge with a hot cathode using a bipolar pulsed substrate bias voltage. The dependence of hardness, internal stress-es, surface morphology, wettability, and the surface potential a-C:H:SiOx films on the thickness was studied. It is shown that increasing the film's thickness enhances the allow-able load on the material and its hardness. The a-C:H:SiOx films had low internal stresses (less than 600 MPa), and the contact angle with water was 75–80°. It is found that an in-crease in the film thickness leads to a rise in the negative surface potential from 50 to 670 mV.