
Оптимизация состава, синтез и изучение широкополосных многослойных зеркал для ЭУФ диапазона
Author(s) -
М.М. Барышева,
С.А. Гарахин,
С.Ю. Зуев,
В.Н. Полковников,
Н.Н. Салащенко,
М.В. Свечников,
Р.М. Смертин,
Н.И. Чхало,
Evgueni Meltchakov
Publication year - 2019
Publication title -
žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-748X
pISSN - 0044-4642
DOI - 10.21883/jtf.2019.11.48341.116-19
Subject(s) - fabrication , stack (abstract data type) , optics , broadband , materials science , wavelength , reflection (computer programming) , optoelectronics , physics , computer science , medicine , alternative medicine , pathology , programming language
The article is devoted to the development, fabrication and analysis of broadband Mo/Si and Mo/Be stack-design multilayer mirrors for the wavelength ranges of 11.1-13.8, 17–21 and 28–33 nm. It is shown that for these structures smooth reflection curves can be achieved in a small number of corrections of the technological process.