Open AccessИсследование изменения кристаллической структуры поверхности Si(111) при ионной бомбардировке и последуещего отжига
Author(s) -
С.Ж. Ниматов,
Б.Е. Умирзаков,
Ф.Я. Худайкулов,
Д.С. Руми
Publication year - 2019
Publication title -
žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-748X
pISSN - 0044-4642
DOI - 10.21883/jtf.2019.10.48181.414-18
Subject(s) - annealing (glass) , ion , monolayer , work function , materials science , irradiation , silicide , metal , range (aeronautics) , silicon , analytical chemistry (journal) , chemistry , metallurgy , nanotechnology , composite material , physics , nuclear physics , organic chemistry , chromatography
The results of studying the modification of the Si (111) surface upon bombardment with ions of alkaline elements in combination with annealing are presented and it is shown that, when the ion energy is in the range of 0.3–1 keV, a monolayer metal silicide coating is formed on the Si surface. It has been established that the work function φ of the surface of a Si (111) sample in a complex manner depends on the dose at various irradiation energies and types of ions.