Open AccessТуннельная эмиссия электронов из наноструктурированных кремниевых катодных матриц с фтор-углеродным покрытием
Author(s) -
Р.К. Яфаров
Publication year - 2019
Publication title -
žurnal tehničeskoj fiziki
Language(s) - English
Resource type - Journals
eISSN - 1726-748X
pISSN - 0044-4642
DOI - 10.21883/jtf.2019.06.47646.274-18
Subject(s) - field electron emission , wafer , materials science , etching (microfabrication) , silicon , carbon fibers , plasma , surface modification , plasma etching , fluorine , nanotechnology , chemical engineering , optoelectronics , analytical chemistry (journal) , composite material , chemistry , metallurgy , environmental chemistry , electron , physics , layer (electronics) , engineering , quantum mechanics , composite number
Variations of the morphology and field-emission properties of surface-structured n - and p -type silicon wafers have been studied. The silicon surface has been structured by etching in a fluorine–carbon plasma and depositing subnanodimensional island carbon masks. It has been shown that surface structuring in a fluorine–carbon plasma makes it possible to reach desired field-emission currents in electric fields of different strengths. Physicochemical models of field emission mechanisms and models of destruction of surface-modified multipoint silicon array cathodes have been considered.